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Interface trap characterization and electrical properties of Au-ZnO nanorod Schottky diodes by conductance and capacitance methods

机译:电导和电容法表征Au-ZnO纳米棒肖特基二极管的界面陷阱和电性能

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摘要

Schottky diodes with Au/ZnO nanorod (NR)/n-SiC configurations have been fabricated and their interface traps and electrical properties have been investigated by current-voltage (I-V), capacitance-voltage (C-V), capacitance-frequency (C-f), and conductance-frequency (G(p)/omega-omega) measurements. Detailed and systematic analysis of the frequency-dependent capacitance and conductance measurements was performed to extract the information about the interface trap states. The discrepancy between the high barrier height values obtained from the I-V and the C-V measurements was also analyzed. The higher capacitance at low frequencies was attributed to excess capacitance as a result of interface states in equilibrium in the ZnO that can follow the alternating current signal. The energy of the interface states (E-ss) with respect to the valence band at the ZnO NR surface was also calculated. The densities of interface states obtained from the conductance and capacitance methods agreed well with each other and this confirm that the observed capacitance and conductance are caused by the same physical processes, i.e., recombination-generation in the interface states. (C) 2012 American Institute of Physics.
机译:制备了具有Au / ZnO纳米棒(NR)/ n-SiC构型的肖特基二极管,并通过电流-电压(IV),电容-电压(CV),电容-频率(Cf)研究了它们的界面陷阱和电性能。和电导频率(G(p)/ omega-omega)测量。对频率相关的电容和电导率测量进行了详细而系统的分析,以提取有关界面陷阱状态的信息。还分析了从I-V和C-V测量获得的高势垒高度值之间的差异。低频下较高的电容归因于多余的电容,这是由于可跟随交流信号的ZnO中处于平衡状态的界面状态所致。还计算了相对于ZnO NR表面价带的界面态能量(E-ss)。从电导和电容方法获得的界面态的密度彼此一致,这证实了观察到的电容和电导是由相同的物理过程引起的,即界面态中的复合产生。 (C)2012美国物理研究所。

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